TY  - JOUR
AU  - Maiti, Sonam
AU  - Ohlerth, Thorsten
AU  - Schmidt, Niclas
AU  - Aussen, Stephan
AU  - Waser, Rainer
AU  - Simon, Ulrich
AU  - Karthäuser, Silvia
TI  - Moisture Effect on the Threshold Switching of TOPO-Stabilized Sub-10 nm HfO 2 Nanocrystals in Nanoscale Devices
JO  - The journal of physical chemistry  / C
VL  - 126
IS  - 43
SN  - 1932-7447
CY  - Washington, DC
PB  - Soc.
M1  - FZJ-2022-03689
SP  - 18571 - 18579
PY  - 2022
AB  - The enduring demand for ever-increasing storage capacities inspires the development of new few nanometer-sized, high-performance memory devices. In this work, tri-n-octylphosphine oxide (TOPO)-stabilized sub-10 nm monoclinic HfO2 nanocrystals (NC) with a rod-like and spherical shape are synthesized and used to build up microscale and nanoscale test devices. The electrical characterization of these devices studied by cyclic current–voltage measurements reveals a redox-like behavior in ambient atmosphere and volatile threshold switching in vacuum. By employing a thorough spectroscopic and surface analysis (FT-IR and NMR spectroscopy and XPS), the origin of this behavior was elucidated. While the redox behavior is enabled by residual moisture present during clean-up of the NC and thin film preparation, which leads to a partial desorption of TOPO from the NC surface, threshold switching is obtained for dry TOPO-stabilized HfO2 NC in microchannel as well as in nanoelectrode devices addressing only a few sub-10 nm TOPO-stabilized HfO2 NC. The results show that integration of sub-10 nm HfO2 NC in nanoscale devices is feasible to build up switching elements.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000877343500001
DO  - DOI:10.1021/acs.jpcc.2c06303
UR  - https://juser.fz-juelich.de/record/910212
ER  -