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@ARTICLE{Politze:916803,
      author       = {Politze, Jochen and Scholz, Stefan and Windgassen, Horst
                      and Schmitz, Christian and Ding, Kaining and Duan, Weiyuan
                      and Knoch, Joachim},
      title        = {{D}irect {E}lectroplating on
                      {I}ndium-{T}in-{O}xide-{C}oated {T}extured and {P}olished
                      {S}ilicon {S}ubstrates via {T}ransition {M}etal {A}lloyed
                      {I}nterlayers},
      journal      = {Journal of the Electrochemical Society},
      volume       = {169},
      number       = {5},
      issn         = {0096-4786},
      address      = {Bristol},
      publisher    = {IOP Publishing},
      reportid     = {FZJ-2023-00106},
      pages        = {052503 -},
      year         = {2022},
      cin          = {IEK-5},
      ddc          = {660},
      cid          = {I:(DE-Juel1)IEK-5-20101013},
      pnm          = {1213 - Cell Design and Development (POF4-121) /
                      Verbundvorhaben: PATOS-Prozess- und Anlagentechnologie zur
                      kostengünstigen und ressourcenschonenden Herstellung von
                      Silizium-Heterostruktursolarzellen mit hohem Wirkungsgrad;
                      Teilvorhaben: Implementierung des µc-Si:H/ZnO:Al-Kontaktes
                      in hocheffizienten Si (0324074E)},
      pid          = {G:(DE-HGF)POF4-1213 / G:(BMWi)0324074E},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000791574300001},
      doi          = {10.1149/1945-7111/ac690b},
      url          = {https://juser.fz-juelich.de/record/916803},
}