001     916960
005     20230123101914.0
037 _ _ |a FZJ-2023-00226
041 _ _ |a English
100 1 _ |a Pütter, Sabine
|0 P:(DE-Juel1)142052
|b 0
|e Corresponding author
|u fzj
111 2 _ |a MLZ User Meeting
|g MLZ User Meeting
|c Online
|d 2021-12-07 - 2021-12-08
|w Germany
245 _ _ |a Thin film fabrication in a new laboratory
260 _ _ |c 2021
336 7 _ |a Conference Paper
|0 33
|2 EndNote
336 7 _ |a INPROCEEDINGS
|2 BibTeX
336 7 _ |a conferenceObject
|2 DRIVER
336 7 _ |a CONFERENCE_POSTER
|2 ORCID
336 7 _ |a Output Types/Conference Poster
|2 DataCite
336 7 _ |a Poster
|b poster
|m poster
|0 PUB:(DE-HGF)24
|s 1673602597_32709
|2 PUB:(DE-HGF)
|x After Call
520 _ _ |a Thin film samples for neutron investigation can be fabricated with a Molecular Beam Epitaxy (MBE) setup on site. The MBE setup is part of the additional facilities which can be booked in combination with a neutron instrument proposal at MLZ. Discuss your ideas with the thin film lab staff and then write a proposal. There are two options for access: In remote access the thin film staff fabricates the sample for you and in collaborative access: you fabricate the sample with support by the thin film laboratory staff. First option only works if the growth parameters are well identified.The MBE setup is equipped with effusion cells, electron guns for electron beam evaporation and a plasma source for use with oxygen or nitrogen. A large variety of deposition materials can be used. Please express your ideas! Compounds may be produced either by codeposition or by shutter modulated growth of individual layers. For in-situ surface structure analysis reflection high and low energy electron diffraction is utilized while Auger electron spectroscopy is applied for in-situ chemical surface analysis.Recently the MBE setup has been moved into the new laboratory in UYL and a new feature, i. e. the deter- mination of the in situ flux rate of atoms using the principle of atomic absorption spectroscopy is about to be established. This method will enhance the precision in stoichometry drastically.Thin film samples which are sensitive to ambient conditions are first fabricated in the MBE setup and then measured at the neutron reflectometer MARIA of JCNS utilizing a versatile small ultra high vacuum condition chamber (A. Syed Mohd et al. Rev. Sci. Instrum., 87, (2016) 123909)In the poster various examples for thin film samples will be presented.
536 _ _ |a 632 - Materials – Quantum, Complex and Functional Materials (POF4-632)
|0 G:(DE-HGF)POF4-632
|c POF4-632
|f POF IV
|x 0
536 _ _ |a 6G4 - Jülich Centre for Neutron Research (JCNS) (FZJ) (POF4-6G4)
|0 G:(DE-HGF)POF4-6G4
|c POF4-6G4
|f POF IV
|x 1
650 2 7 |a Condensed Matter Physics
|0 V:(DE-MLZ)SciArea-120
|2 V:(DE-HGF)
|x 0
650 2 7 |a Magnetism
|0 V:(DE-MLZ)SciArea-170
|2 V:(DE-HGF)
|x 1
650 1 7 |a Magnetic Materials
|0 V:(DE-MLZ)GC-1604-2016
|2 V:(DE-HGF)
|x 0
693 _ _ |0 EXP:(DE-MLZ)MBE-MLZ-20151210
|5 EXP:(DE-MLZ)MBE-MLZ-20151210
|e MBE-MLZ: Molecular Beam Epitaxy at MLZ
|x 0
909 C O |o oai:juser.fz-juelich.de:916960
|p VDB:MLZ
|p VDB
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 0
|6 P:(DE-Juel1)142052
913 1 _ |a DE-HGF
|b Forschungsbereich Materie
|l From Matter to Materials and Life
|1 G:(DE-HGF)POF4-630
|0 G:(DE-HGF)POF4-632
|3 G:(DE-HGF)POF4
|2 G:(DE-HGF)POF4-600
|4 G:(DE-HGF)POF
|v Materials – Quantum, Complex and Functional Materials
|x 0
913 1 _ |a DE-HGF
|b Forschungsbereich Materie
|l Großgeräte: Materie
|1 G:(DE-HGF)POF4-6G0
|0 G:(DE-HGF)POF4-6G4
|3 G:(DE-HGF)POF4
|2 G:(DE-HGF)POF4-600
|4 G:(DE-HGF)POF
|v Jülich Centre for Neutron Research (JCNS) (FZJ)
|x 1
914 1 _ |y 2022
920 _ _ |l yes
920 1 _ |0 I:(DE-Juel1)JCNS-2-20110106
|k JCNS-2
|l Streumethoden
|x 0
920 1 _ |0 I:(DE-Juel1)JCNS-4-20201012
|k JCNS-4
|l JCNS-4
|x 1
920 1 _ |0 I:(DE-Juel1)JCNS-FRM-II-20110218
|k JCNS-FRM-II
|l JCNS-FRM-II
|x 2
920 1 _ |0 I:(DE-588b)4597118-3
|k MLZ
|l Heinz Maier-Leibnitz Zentrum
|x 3
980 _ _ |a poster
980 _ _ |a VDB
980 _ _ |a I:(DE-Juel1)JCNS-2-20110106
980 _ _ |a I:(DE-Juel1)JCNS-4-20201012
980 _ _ |a I:(DE-Juel1)JCNS-FRM-II-20110218
980 _ _ |a I:(DE-588b)4597118-3
980 _ _ |a UNRESTRICTED


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Marc 21