Hauptseite > Publikationsdatenbank > The influence of the first nucleation states on electronic in-gap states of HfO2 nanoislands > print |
001 | 917494 | ||
005 | 20230310131404.0 | ||
037 | _ | _ | |a FZJ-2023-00707 |
100 | 1 | _ | |a Schmidt, Niclas |0 P:(DE-Juel1)179230 |b 0 |u fzj |
111 | 2 | _ | |a ECOSS 35 University of Luxembourg |c Luxembourg |d 2022-08-29 - 2022-09-02 |w Luxembourg |
245 | _ | _ | |a The influence of the first nucleation states on electronic in-gap states of HfO2 nanoislands |
260 | _ | _ | |c 2022 |
336 | 7 | _ | |a Conference Paper |0 33 |2 EndNote |
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536 | _ | _ | |a SFB 917 B03 - Grundlagen der Ionentransportprozesse in resistiv schaltenden Oxiden (B03) (202263209) |0 G:(GEPRIS)202263209 |c 202263209 |x 1 |
700 | 1 | _ | |a Rushchanskii, Konstantin |0 P:(DE-Juel1)130926 |b 1 |u fzj |
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700 | 1 | _ | |a Karthäuser, Silvia |0 P:(DE-Juel1)130751 |b 4 |u fzj |
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