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@ARTICLE{Roeckerath:9226,
author = {Roeckerath, M. and Lopes, J. M. J. and Durgun Özben, E.
and Urban, C. and Schubert, J. and Mantl, S. and Jia, Y. and
Schlom, D.G.},
title = {{I}nvestigation of terbium scandate as an alternative gate
dielectric in fully depleted transistors},
journal = {Applied physics letters},
volume = {96},
issn = {0003-6951},
address = {Melville, NY},
publisher = {American Institute of Physics},
reportid = {PreJuSER-9226},
pages = {013513},
year = {2010},
note = {This work was partially supported by the European network
of excellence "Nanosil" (Grant No. IST-216171).},
abstract = {Terbium scandate thin films were deposited by e-gun
evaporation on (100) silicon substrates. Rutherford
backscattering spectrometry and x-ray diffraction studies
revealed homogeneous chemical compositions of the films. A
dielectric constant of 26 and CV-curves with small
hystereses were measured as well as low leakage current
densities of < 1 nA/cm(2). Fully depleted n-type
field-effect transistors on thin silicon-on-insulator
substrates with terbium scandate gate dielectrics were
fabricated with a gate-last process. The devices show
inverse subthreshold slopes of 80 mV/dec and a carrier
mobility for electrons of 225 cm(2)/V center dot s was
extracted.},
keywords = {J (WoSType)},
cin = {IBN-1 / JARA-FIT},
ddc = {530},
cid = {I:(DE-Juel1)VDB799 / $I:(DE-82)080009_20140620$},
pnm = {Grundlagen für zukünftige Informationstechnologien},
pid = {G:(DE-Juel1)FUEK412},
shelfmark = {Physics, Applied},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000273473200069},
doi = {10.1063/1.3275731},
url = {https://juser.fz-juelich.de/record/9226},
}