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Effective mass and I-V characterization of biaxial tensile strained SOI MOSFETs
Feste, S. F.FZJ* ; Knoch, J.FZJ* ; Buca, D.FZJ* ; Zhao, Q. T.FZJ* ; Schäpers, T.FZJ* ; Mantl, S.FZJ*
2010
2010ULIS 2010
Seminar, Glasgow, ScotlandGlasgow, Scotland, 18 Mar 20102010-03-18
Note: Record converted from VDB: 12.11.2012
Contributing Institute(s):
- Halbleiter-Nanoelektronik (IBN-1)
- Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
Research Program(s):
- Grundlagen für zukünftige Informationstechnologien (P42)
Appears in the scientific report
2010