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@ARTICLE{Rosenzweig:1005766,
author = {Rosenzweig, D. S. and Hansemann, M. N. L. and Schnedler, M.
and Ebert, Ph. and Eisele, H.},
title = {{A}tomically resolved study of initial stages of hydrogen
etching and adsorption on {G}a{A}s(110)},
journal = {Physical review materials},
volume = {6},
number = {12},
issn = {2475-9953},
address = {College Park, MD},
publisher = {APS},
reportid = {FZJ-2023-01619},
pages = {124603},
year = {2022},
abstract = {The initial stages of hydrogen adsorption on GaAs(110)
surfaces at room temperature are investigated by atomically
resolved scanning tunneling microscopy and spectroscopy. Two
effects are found to occur simultaneously: On the one hand a
surface phase separation occurs, creating 1×1 reconstructed
fully hydrogen-covered areas while leaving the surface in
between completely hydrogen free. In the fully
hydrogen-covered areas, hydrogen bonds equally to As- and
Ga-derived dangling bonds, unbuckling and passivating the
surface. On the other hand, hydrogen-induced point defects
are formed with increasing density. The dominating defects
consist of As vacancy–hydrogen defect complexes, formed by
preferential hydrogen etching of As. Using a defect-molecule
model the Ga-H bridge bonds and double-occupied Ga dangling
bonds are suggested to be at the origin of the observed
surface Fermi level pinning 0.25 to 0.3 eV above the valence
band edge, identical within error margins for p- and n-doped
GaAs(110).},
cin = {ER-C-1},
ddc = {530},
cid = {I:(DE-Juel1)ER-C-1-20170209},
pnm = {5351 - Platform for Correlative, In Situ and Operando
Characterization (POF4-535)},
pid = {G:(DE-HGF)POF4-5351},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000914422000003},
doi = {10.1103/PhysRevMaterials.6.124603},
url = {https://juser.fz-juelich.de/record/1005766},
}