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| Hauptseite > Publikationsdatenbank > Study of Ni–Cr / CrN bilayer thin films resistor prepared by magnetron sputtering > print |
| Hauptseite > Publikationsdatenbank > Study of Ni–Cr / CrN bilayer thin films resistor prepared by magnetron sputtering > print |
| 001 | 1006788 | ||
| 005 | 20240116084315.0 | ||
| 024 | 7 | _ | |a 10.1016/j.vacuum.2023.112085 |2 doi |
| 024 | 7 | _ | |a 0042-207X |2 ISSN |
| 024 | 7 | _ | |a 1879-2715 |2 ISSN |
| 024 | 7 | _ | |a 10.34734/FZJ-2023-01841 |2 datacite_doi |
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| 037 | _ | _ | |a FZJ-2023-01841 |
| 082 | _ | _ | |a 530 |
| 100 | 1 | _ | |a Lee, Ying-Chieh |0 0000-0002-5414-5497 |b 0 |e Corresponding author |
| 245 | _ | _ | |a Study of Ni–Cr / CrN bilayer thin films resistor prepared by magnetron sputtering |
| 260 | _ | _ | |a Amsterdam [u.a.] |c 2023 |b Elsevier Science |
| 336 | 7 | _ | |a article |2 DRIVER |
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| 336 | 7 | _ | |a Journal Article |b journal |m journal |0 PUB:(DE-HGF)16 |s 1702463527_27254 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a ARTICLE |2 BibTeX |
| 336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
| 336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
| 520 | _ | _ | |a In this study, we prepare bilayer Ni–Cr/CrN films. A Ni–Cr resistive thin film was prepared by DC sputtering from targets of Ni0.8-Cr0.2 casting alloy. A CrN protection thin film was prepared based on optimum sputtering conditions of the Ni–Cr film, which was made by DC and RF magnetron co-sputtering from targets of Ni0.8-Cr0.2 casting alloy and chromium. The electrical properties and microstructures of the resistive films at different annealing temperatures were investigated. The phase evolution, microstructural and composition of Ni–Cr and NiCr/CrN films were characterized by X-ray diffraction (XRD), field-emission transmission electron microscopy (HRTEM) and auger electron spectroscopy (AES). The results indicated that the resistivity of the bilayer Ni–Cr/CrN films is higher than Ni–Cr films. When the annealing temperature was set to 300 °C, the bilayer Ni–Cr/CrN films exhibited a resistivity ∼303 μΩ cm with the smallest temperature coefficient of resistance (TCR) of −3 ppm/°C. However, the Ni–Cr films that annealed at 300 °C showed a resistivity of ∼210 μΩ cm, with a TCR of 13 ppm/°C. In addition, the TCR and resistivity variation rate of CrN protective coating layer on the Ni–Cr films after high temperature testing at 150 °C up to 100 h was done. The results show that the average change rate of the TCR for bilayer Ni–Cr/CrN films is lower than single Ni–Cr films. |
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| 588 | _ | _ | |a Dataset connected to CrossRef, Journals: juser.fz-juelich.de |
| 700 | 1 | _ | |a Yen, Voon Choong |0 P:(DE-HGF)0 |b 1 |
| 700 | 1 | _ | |a Pithan, Christian |0 P:(DE-Juel1)130894 |b 2 |u fzj |
| 700 | 1 | _ | |a Jan, Jhen-Hau |0 0000-0002-5164-3175 |b 3 |
| 773 | _ | _ | |a 10.1016/j.vacuum.2023.112085 |g Vol. 213, p. 112085 - |0 PERI:(DE-600)1479044-0 |p 112085 - |t Vacuum |v 213 |y 2023 |x 0042-207X |
| 856 | 4 | _ | |y OpenAccess |u https://juser.fz-juelich.de/record/1006788/files/NiCr-CrN%20thin%20film%20Figure20230129.doc |
| 856 | 4 | _ | |y OpenAccess |u https://juser.fz-juelich.de/record/1006788/files/NiCr-CrN%20thin%20film%20manuscript20230207.doc |
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