%0 Conference Paper
%A Brackmann, Varvara
%A Neul, Malte
%A Friedrich, Michael
%A Langheinrich, Wolfram
%A Simon, Maik
%A Muster, Pascal
%A Pregl, Sebastian
%A Demmler, Arne
%A Hanisch, Norbert
%A Lederer, Maximilian
%A Zimmermann, Katrin
%A Klos, Jan
%A Reichmann, Felix
%A Yamamoto, Yuji
%A Wislicenus, Marcus
%A Dahl, Claus
%A Schreiber, Lars R.
%A Bluhm, Hendrik
%A Lilienthal-Uhlig, Benjamin
%Y Behringer, Uwe F.
%Y Loeschner, Hans
%Y Finders, Jo
%T Fabrication of gate electrodes for scalable quantum computing using CMOS industry compatible e-beam lithography and numerical simulation of the resulting quantum device
%I SPIE
%M FZJ-2024-01807
%P 1-10
%D 2023
%< 38th European Mask and Lithography Conference (EMLC 2023) : [Proceedings] - SPIE, 2023. - ISBN 97815106686079781510668614 - doi:10.1117/12.2675943
%B 38th European Mask and Lithography Conference
%C 19 Jun 2023 - 21 Jun 2023, Dresden (Germany)
Y2 19 Jun 2023 - 21 Jun 2023
M2 Dresden, Germany
%F PUB:(DE-HGF)8 ; PUB:(DE-HGF)7
%9 Contribution to a conference proceedingsContribution to a book
%R 10.1117/12.2675943
%U https://juser.fz-juelich.de/record/1023794