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001023794 1112_ $$a38th European Mask and Lithography Conference$$cDresden$$d2023-06-19 - 2023-06-21$$wGermany
001023794 245__ $$aFabrication of gate electrodes for scalable quantum computing using CMOS industry compatible e-beam lithography and numerical simulation of the resulting quantum device
001023794 260__ $$bSPIE$$c2023
001023794 29510 $$a38th European Mask and Lithography Conference (EMLC 2023) : [Proceedings] - SPIE, 2023. - ISBN 97815106686079781510668614 - doi:10.1117/12.2675943
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001023794 7001_ $$0P:(DE-HGF)0$$aNeul, Malte$$b1
001023794 7001_ $$0P:(DE-HGF)0$$aFriedrich, Michael$$b2
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001023794 7001_ $$0P:(DE-Juel1)172641$$aSchreiber, Lars R.$$b16$$eCorresponding author$$ufzj
001023794 7001_ $$0P:(DE-Juel1)172019$$aBluhm, Hendrik$$b17$$ufzj
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