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@INPROCEEDINGS{Brackmann:1023794,
author = {Brackmann, Varvara and Neul, Malte and Friedrich, Michael
and Langheinrich, Wolfram and Simon, Maik and Muster, Pascal
and Pregl, Sebastian and Demmler, Arne and Hanisch, Norbert
and Lederer, Maximilian and Zimmermann, Katrin and Klos, Jan
and Reichmann, Felix and Yamamoto, Yuji and Wislicenus,
Marcus and Dahl, Claus and Schreiber, Lars R. and Bluhm,
Hendrik and Lilienthal-Uhlig, Benjamin},
editor = {Behringer, Uwe F. and Loeschner, Hans and Finders, Jo},
title = {{F}abrication of gate electrodes for scalable quantum
computing using {CMOS} industry compatible e-beam
lithography and numerical simulation of the resulting
quantum device},
publisher = {SPIE},
reportid = {FZJ-2024-01807},
pages = {1-10},
year = {2023},
comment = {38th European Mask and Lithography Conference (EMLC 2023) :
[Proceedings] - SPIE, 2023. - ISBN
97815106686079781510668614 - doi:10.1117/12.2675943},
booktitle = {38th European Mask and Lithography
Conference (EMLC 2023) : [Proceedings]
- SPIE, 2023. - ISBN
97815106686079781510668614 -
doi:10.1117/12.2675943},
month = {Jun},
date = {2023-06-19},
organization = {38th European Mask and Lithography
Conference, Dresden (Germany), 19 Jun
2023 - 21 Jun 2023},
cin = {PGI-11},
cid = {I:(DE-Juel1)PGI-11-20170113},
pnm = {5221 - Advanced Solid-State Qubits and Qubit Systems
(POF4-522)},
pid = {G:(DE-HGF)POF4-5221},
typ = {PUB:(DE-HGF)8 / PUB:(DE-HGF)7},
doi = {10.1117/12.2675943},
url = {https://juser.fz-juelich.de/record/1023794},
}