%0 Journal Article
%A Mikulics, Martin
%A Winden, Andreas
%A Mayer, Joachim
%A Hardtdegen, Hilde
%T Developments in Mask-Free Singularly Addressable Nano-LED Lithography
%J Nanomanufacturing
%V 4
%N 2
%@ 2673-687X
%C Basel, Switzerland
%I MDPI
%M FZJ-2024-03100
%P 99-110
%D 2024
%X LED devices are increasingly gaining importance in lithography approaches due to the fact that they can be used flexibly for mask-less patterning. In this study, we briefly report on developments in mask-free lithography approaches based on nano-LED devices and summarize our current achievements in the different building blocks needed for its application. Individually addressable nano-LED structures can form the basis for an unprecedented fast and flexible patterning, on demand, in photo-chemically sensitive films. We introduce a driving scheme for nano-LEDs in arrays serving for a singularly addressable approach. Furthermore, we discuss the challenges facing nano-LED fabrication and possibilities to improve their performance. Additionally, we introduce LED structures based on a hybrid nanocrystal/nano-LED approach. Lastly, we provide an outlook how this approach could further develop for next generation lithography systems. This technique has a huge potential to revolutionize the field and to contribute significantly to energy and resources saving device nanomanufacturing.
%F PUB:(DE-HGF)16
%9 Journal Article
%R 10.3390/nanomanufacturing4020007
%U https://juser.fz-juelich.de/record/1025717