Journal Article

FZJ-2024-03100

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Developments in Mask-Free Singularly Addressable Nano-LED Lithography

Mikulics, M. (Corresponding author)FZJ* ; Winden, A. ; Mayer, J.FZJ* ; Hardtdegen, H. (Corresponding author)FZJ*

2024
MDPI Basel, Switzerland

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Please use a persistent id in citations: doi:10.3390/nanomanufacturing4020007  doi:10.34734/FZJ-2024-03100

Abstract: LED devices are increasingly gaining importance in lithography approaches due to the fact that they can be used flexibly for mask-less patterning. In this study, we briefly report on developments in mask-free lithography approaches based on nano-LED devices and summarize our current achievements in the different building blocks needed for its application. Individually addressable nano-LED structures can form the basis for an unprecedented fast and flexible patterning, on demand, in photo-chemically sensitive films. We introduce a driving scheme for nano-LEDs in arrays serving for a singularly addressable approach. Furthermore, we discuss the challenges facing nano-LED fabrication and possibilities to improve their performance. Additionally, we introduce LED structures based on a hybrid nanocrystal/nano-LED approach. Lastly, we provide an outlook how this approach could further develop for next generation lithography systems. This technique has a huge potential to revolutionize the field and to contribute significantly to energy and resources saving device nanomanufacturing.

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Contributing Institute(s):

1. Materialwissenschaft u. Werkstofftechnik (ER-C-2)

Research Program(s):

1. 5353 - Understanding the Structural and Functional Behavior of Solid State Systems (POF4-535) (POF4-535)

Appears in the scientific report 2024

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