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001025717 0247_ $$2datacite_doi$$a10.34734/FZJ-2024-03100
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001025717 1001_ $$0P:(DE-Juel1)128613$$aMikulics, Martin$$b0$$eCorresponding author
001025717 245__ $$aDevelopments in Mask-Free Singularly Addressable Nano-LED Lithography
001025717 260__ $$aBasel, Switzerland$$bMDPI$$c2024
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001025717 520__ $$aLED devices are increasingly gaining importance in lithography approaches due to the fact that they can be used flexibly for mask-less patterning. In this study, we briefly report on developments in mask-free lithography approaches based on nano-LED devices and summarize our current achievements in the different building blocks needed for its application. Individually addressable nano-LED structures can form the basis for an unprecedented fast and flexible patterning, on demand, in photo-chemically sensitive films. We introduce a driving scheme for nano-LEDs in arrays serving for a singularly addressable approach. Furthermore, we discuss the challenges facing nano-LED fabrication and possibilities to improve their performance. Additionally, we introduce LED structures based on a hybrid nanocrystal/nano-LED approach. Lastly, we provide an outlook how this approach could further develop for next generation lithography systems. This technique has a huge potential to revolutionize the field and to contribute significantly to energy and resources saving device nanomanufacturing.
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001025717 7001_ $$0P:(DE-HGF)0$$aWinden, Andreas$$b1
001025717 7001_ $$0P:(DE-Juel1)130824$$aMayer, Joachim$$b2
001025717 7001_ $$0P:(DE-Juel1)125593$$aHardtdegen, Hilde$$b3$$eCorresponding author
001025717 773__ $$0PERI:(DE-600)3136586-3$$a10.3390/nanomanufacturing4020007$$gVol. 4, no. 2, p. 99 - 110$$n2$$p99-110$$tNanomanufacturing$$v4$$x2673-687X$$y2024
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