TY  - JOUR
AU  - Mikulics, Martin
AU  - Winden, Andreas
AU  - Mayer, Joachim
AU  - Hardtdegen, Hilde
TI  - Developments in Mask-Free Singularly Addressable Nano-LED Lithography
JO  - Nanomanufacturing
VL  - 4
IS  - 2
SN  - 2673-687X
CY  - Basel, Switzerland
PB  - MDPI
M1  - FZJ-2024-03100
SP  - 99-110
PY  - 2024
AB  - LED devices are increasingly gaining importance in lithography approaches due to the fact that they can be used flexibly for mask-less patterning. In this study, we briefly report on developments in mask-free lithography approaches based on nano-LED devices and summarize our current achievements in the different building blocks needed for its application. Individually addressable nano-LED structures can form the basis for an unprecedented fast and flexible patterning, on demand, in photo-chemically sensitive films. We introduce a driving scheme for nano-LEDs in arrays serving for a singularly addressable approach. Furthermore, we discuss the challenges facing nano-LED fabrication and possibilities to improve their performance. Additionally, we introduce LED structures based on a hybrid nanocrystal/nano-LED approach. Lastly, we provide an outlook how this approach could further develop for next generation lithography systems. This technique has a huge potential to revolutionize the field and to contribute significantly to energy and resources saving device nanomanufacturing.
LB  - PUB:(DE-HGF)16
DO  - DOI:10.3390/nanomanufacturing4020007
UR  - https://juser.fz-juelich.de/record/1025717
ER  -