Home > Publications database > Developments in Mask-Free Singularly Addressable Nano-LED Lithography > print |
001 | 1025717 | ||
005 | 20240516205741.0 | ||
024 | 7 | _ | |a 10.3390/nanomanufacturing4020007 |2 doi |
024 | 7 | _ | |a 10.34734/FZJ-2024-03100 |2 datacite_doi |
037 | _ | _ | |a FZJ-2024-03100 |
041 | _ | _ | |a English |
082 | _ | _ | |a 600 |
100 | 1 | _ | |a Mikulics, Martin |0 P:(DE-Juel1)128613 |b 0 |e Corresponding author |
245 | _ | _ | |a Developments in Mask-Free Singularly Addressable Nano-LED Lithography |
260 | _ | _ | |a Basel, Switzerland |c 2024 |b MDPI |
336 | 7 | _ | |a article |2 DRIVER |
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336 | 7 | _ | |a ARTICLE |2 BibTeX |
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336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
520 | _ | _ | |a LED devices are increasingly gaining importance in lithography approaches due to the fact that they can be used flexibly for mask-less patterning. In this study, we briefly report on developments in mask-free lithography approaches based on nano-LED devices and summarize our current achievements in the different building blocks needed for its application. Individually addressable nano-LED structures can form the basis for an unprecedented fast and flexible patterning, on demand, in photo-chemically sensitive films. We introduce a driving scheme for nano-LEDs in arrays serving for a singularly addressable approach. Furthermore, we discuss the challenges facing nano-LED fabrication and possibilities to improve their performance. Additionally, we introduce LED structures based on a hybrid nanocrystal/nano-LED approach. Lastly, we provide an outlook how this approach could further develop for next generation lithography systems. This technique has a huge potential to revolutionize the field and to contribute significantly to energy and resources saving device nanomanufacturing. |
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588 | _ | _ | |a Dataset connected to CrossRef, Journals: juser.fz-juelich.de |
700 | 1 | _ | |a Winden, Andreas |0 P:(DE-HGF)0 |b 1 |
700 | 1 | _ | |a Mayer, Joachim |0 P:(DE-Juel1)130824 |b 2 |
700 | 1 | _ | |a Hardtdegen, Hilde |0 P:(DE-Juel1)125593 |b 3 |e Corresponding author |
773 | _ | _ | |a 10.3390/nanomanufacturing4020007 |g Vol. 4, no. 2, p. 99 - 110 |0 PERI:(DE-600)3136586-3 |n 2 |p 99-110 |t Nanomanufacturing |v 4 |y 2024 |x 2673-687X |
856 | 4 | _ | |y OpenAccess |u https://juser.fz-juelich.de/record/1025717/files/nanomanufacturing-04-00007.pdf |
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