001     1025717
005     20240516205741.0
024 7 _ |a 10.3390/nanomanufacturing4020007
|2 doi
024 7 _ |a 10.34734/FZJ-2024-03100
|2 datacite_doi
037 _ _ |a FZJ-2024-03100
041 _ _ |a English
082 _ _ |a 600
100 1 _ |a Mikulics, Martin
|0 P:(DE-Juel1)128613
|b 0
|e Corresponding author
245 _ _ |a Developments in Mask-Free Singularly Addressable Nano-LED Lithography
260 _ _ |a Basel, Switzerland
|c 2024
|b MDPI
336 7 _ |a article
|2 DRIVER
336 7 _ |a Output Types/Journal article
|2 DataCite
336 7 _ |a Journal Article
|b journal
|m journal
|0 PUB:(DE-HGF)16
|s 1715843855_2587
|2 PUB:(DE-HGF)
336 7 _ |a ARTICLE
|2 BibTeX
336 7 _ |a JOURNAL_ARTICLE
|2 ORCID
336 7 _ |a Journal Article
|0 0
|2 EndNote
520 _ _ |a LED devices are increasingly gaining importance in lithography approaches due to the fact that they can be used flexibly for mask-less patterning. In this study, we briefly report on developments in mask-free lithography approaches based on nano-LED devices and summarize our current achievements in the different building blocks needed for its application. Individually addressable nano-LED structures can form the basis for an unprecedented fast and flexible patterning, on demand, in photo-chemically sensitive films. We introduce a driving scheme for nano-LEDs in arrays serving for a singularly addressable approach. Furthermore, we discuss the challenges facing nano-LED fabrication and possibilities to improve their performance. Additionally, we introduce LED structures based on a hybrid nanocrystal/nano-LED approach. Lastly, we provide an outlook how this approach could further develop for next generation lithography systems. This technique has a huge potential to revolutionize the field and to contribute significantly to energy and resources saving device nanomanufacturing.
536 _ _ |a 5353 - Understanding the Structural and Functional Behavior of Solid State Systems (POF4-535)
|0 G:(DE-HGF)POF4-5353
|c POF4-535
|f POF IV
|x 0
588 _ _ |a Dataset connected to CrossRef, Journals: juser.fz-juelich.de
700 1 _ |a Winden, Andreas
|0 P:(DE-HGF)0
|b 1
700 1 _ |a Mayer, Joachim
|0 P:(DE-Juel1)130824
|b 2
700 1 _ |a Hardtdegen, Hilde
|0 P:(DE-Juel1)125593
|b 3
|e Corresponding author
773 _ _ |a 10.3390/nanomanufacturing4020007
|g Vol. 4, no. 2, p. 99 - 110
|0 PERI:(DE-600)3136586-3
|n 2
|p 99-110
|t Nanomanufacturing
|v 4
|y 2024
|x 2673-687X
856 4 _ |y OpenAccess
|u https://juser.fz-juelich.de/record/1025717/files/nanomanufacturing-04-00007.pdf
856 4 _ |y OpenAccess
|x icon
|u https://juser.fz-juelich.de/record/1025717/files/nanomanufacturing-04-00007.gif?subformat=icon
856 4 _ |y OpenAccess
|x icon-1440
|u https://juser.fz-juelich.de/record/1025717/files/nanomanufacturing-04-00007.jpg?subformat=icon-1440
856 4 _ |y OpenAccess
|x icon-180
|u https://juser.fz-juelich.de/record/1025717/files/nanomanufacturing-04-00007.jpg?subformat=icon-180
856 4 _ |y OpenAccess
|x icon-640
|u https://juser.fz-juelich.de/record/1025717/files/nanomanufacturing-04-00007.jpg?subformat=icon-640
909 C O |o oai:juser.fz-juelich.de:1025717
|p openaire
|p open_access
|p VDB
|p driver
|p dnbdelivery
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 0
|6 P:(DE-Juel1)128613
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 2
|6 P:(DE-Juel1)130824
910 1 _ |a Forschungszentrum Jülich
|0 I:(DE-588b)5008462-8
|k FZJ
|b 3
|6 P:(DE-Juel1)125593
913 1 _ |a DE-HGF
|b Key Technologies
|l Materials Systems Engineering
|1 G:(DE-HGF)POF4-530
|0 G:(DE-HGF)POF4-535
|3 G:(DE-HGF)POF4
|2 G:(DE-HGF)POF4-500
|4 G:(DE-HGF)POF
|v Materials Information Discovery
|9 G:(DE-HGF)POF4-5353
|x 0
914 1 _ |y 2024
915 _ _ |a OpenAccess
|0 StatID:(DE-HGF)0510
|2 StatID
915 _ _ |a Creative Commons Attribution CC BY 4.0
|0 LIC:(DE-HGF)CCBY4
|2 HGFVOC
920 _ _ |l yes
920 1 _ |0 I:(DE-Juel1)ER-C-2-20170209
|k ER-C-2
|l Materialwissenschaft u. Werkstofftechnik
|x 0
980 _ _ |a journal
980 _ _ |a VDB
980 _ _ |a UNRESTRICTED
980 _ _ |a I:(DE-Juel1)ER-C-2-20170209
980 1 _ |a FullTexts


LibraryCollectionCLSMajorCLSMinorLanguageAuthor
Marc 21