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024 7 _ |2 DOI
|a 10.1016/j.susc.2009.12.006
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082 _ _ |a 540
084 _ _ |2 WoS
|a Chemistry, Physical
084 _ _ |2 WoS
|a Physics, Condensed Matter
100 1 _ |0 P:(DE-HGF)0
|a Brona, J.
|b 0
245 _ _ |a Formation of pits during growth of Si/Ge nanostructures
260 _ _ |a Amsterdam
|b Elsevier
|c 2010
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336 7 _ |2 BibTeX
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336 7 _ |2 ORCID
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336 7 _ |2 DRIVER
|a article
440 _ 0 |0 5673
|a Surface Science
|v 604
|x 0039-6028
|y 3
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a Alternating deposition of Ge and Si in the step-flow growth regime using Bi acting as a surfactant can lead to a spontaneous formation of one atomic layer deep pits in the area of surface covered by Ge. During Si growth Ge atoms of the epitaxial 2D Ge layer move to Si step edges where stronger bonds with Si atoms are formed. Appropriate growth conditions can suppress or enhance the pit formation effect and consequently a new type of self-organized nanostructures can be formed. (C) 2009 Elsevier BY. All rights reserved.
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650 _ 7 |2 WoSType
|a J
653 2 0 |2 Author
|a Nanostructures
653 2 0 |2 Author
|a Self-assembly
653 2 0 |2 Author
|a Silicon
653 2 0 |2 Author
|a Germanium
653 2 0 |2 Author
|a Scanning tunneling microscopy
700 1 _ |0 P:(DE-Juel1)VDB10516
|a Cherepanov, V.
|b 1
|u FZJ
700 1 _ |0 P:(DE-Juel1)VDB71268
|a Romanyuk, K.
|b 2
|u FZJ
700 1 _ |0 P:(DE-Juel1)VDB5601
|a Voigtländer, B.
|b 3
|u FZJ
773 _ _ |0 PERI:(DE-600)1479030-0
|a 10.1016/j.susc.2009.12.006
|g Vol. 604
|p 424-427
|q 604
|t Surface science
|v 604
|x 0039-6028
|y 2010
856 7 _ |u http://dx.doi.org/10.1016/j.susc.2009.12.006
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