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@INPROCEEDINGS{Singh:1047032,
author = {Singh, Ankita and Bednarski-Meinke, C. and Kentzinger, E.
and de Oliveira Lima, V. A.},
title = {{M}agnetic and {T}ransport {S}ignatures of {S}train in
{S}r{R}u{O}3 {T}hin {F}ilms:{I}nsights from {STO} and
{S}i-{B}ased {S}ubstrates},
reportid = {FZJ-2025-04083},
year = {2025},
abstract = {SrRuO3 (SRO), a widely studied ferromagnetic metallic
perovskite oxide, exhibits perpendicular magneticanisotropy
(PMA) when subjected to appropriate strain conditions. Its
excellent lattice matchingwith SrTiO3 (STO) enables nearly
perfect epitaxial growth, making it an ideal platform for
investigatingstrain-induced effects in functional oxide
systems [1]. Although strain-tuned ferromagnetismhas been
examined in several perovskite heterostructures, the
influence of strain on the magneticanisotropy and transport
behavior of SRO remains an ongoing research focus. The
anomalous Halleffect (AHE) in SRO displays non-traditional
characteristics that are highly sensitive to strain,
filmthickness, and elemental doping, warranting further
studies on how epitaxial strain modulates itselectronic and
magnetic responses. To delve deeper into these phenomena,
~20 nm SRO thin filmswere fabricated using high oxygen
pressure sputtering (HOPS) on TiO₂-terminated STO (001)
singlecrystals and on STO-buffered (4 nm) Si (001)
substrates, under identical deposition conditions.
X-raydiffraction (XRD) confirmed epitaxial growth, and X-ray
reflectivity (XRR) provided precise informationof film
thickness and interfacial roughness. Magnetization studies
indicated a Curie temperature(Tc) of 155 K for both film
types but revealed contrasting magnetic anisotropies. The
SRO/STO filmdemonstrated a stronger out-of-plane magnetic
component, whereas the SRO/STO/Si film favored
inplanemagnetization. This directional dependence was
further reflected in magnetoresistance $(MR\%)measurements,$
which peaked when the magnetic field aligns with each
sample’s easy axis. Notably,AHE results for the SRO/STO/Si
film showed an anomalous peak, potentially arising from
Ru-sitevacancies [2], implying the coexistence of multiple
magnetic contributions within the film. Theseresults
highlight the pivotal influence of epitaxial strain in
controlling both the magnetic orientationand electronic
transport properties in SRO-based heterostructures. To
further unravel the role of theSTO buffer layer in
modulating interfacial magnetism, we plan to conduct
detailed polarized neutronreflectometry (PNR) measurements
on SRO films grown on STO-buffered Si and single-crystal
STOsubstrates. These experiments, scheduled for October 2025
at the Spallation Neutron Source (SNS),ORNL, USA, will offer
deeper insights into strain-driven magnetic phenomena at the
atomic scalein complex oxide systems.},
month = {Oct},
date = {2025-10-07},
organization = {JCNS Workshop 2025, Trends and
Perspectives in Neutron Scattering.
Quantum Materials: Theory and
Experiments, Evangelische Akademie
Tutzing (Germany), 7 Oct 2025 - 9 Oct
2025},
subtyp = {Invited},
cin = {JCNS-2 / JARA-FIT},
cid = {I:(DE-Juel1)JCNS-2-20110106 / $I:(DE-82)080009_20140620$},
pnm = {632 - Materials – Quantum, Complex and Functional
Materials (POF4-632) / 6G4 - Jülich Centre for Neutron
Research (JCNS) (FZJ) (POF4-6G4)},
pid = {G:(DE-HGF)POF4-632 / G:(DE-HGF)POF4-6G4},
typ = {PUB:(DE-HGF)6},
url = {https://juser.fz-juelich.de/record/1047032},
}