%0 Journal Article
%A Demarina, Nataliya
%A Karimzadah, Soraya
%A Bennemann, Benjamin
%A Krause, Christoph
%A Jalil, Abdur Rehman
%A Hartmann, Heinrich
%A Kardynał, Beata
%A Lepsa, Mihail Ion
%A Gruetzmacher, Detlev
%T In situ Al2O3 atomic layer deposition on pristine (0 0 1) GaAs: interface chemistry and its implication on charge carrier recombination and Fermi level pinning
%J Applied surface science
%V 720
%@ 0169-4332
%C Amsterdam
%I Elsevier
%M FZJ-2025-05438
%P 165114 -
%D 2026
%F PUB:(DE-HGF)16
%9 Journal Article
%R 10.1016/j.apsusc.2025.165114
%U https://juser.fz-juelich.de/record/1049653