Physical Vapor Deposition (PVD): Principles, Processes &amp; Applications

Liu, Jialiang

guest :: login JuSER
		Search		Submit		Personalize Your alerts Your baskets Your searches		Help

Home > Publications database > Physical Vapor Deposition (PVD): Principles, Processes & Applications > RIS

TY  - CONF
AU  - Liu, Jialiang
TI  - Physical Vapor Deposition (PVD): Principles, Processes &amp; Applications
PB  - RWTH Aachen
M1  - FZJ-2026-00494
PY  - 2025
T2  - Electrochemistry Days 2025
CY  - 1 Sep 2025 - 2 Sep 2025, AA Eindhoven (Netherlands)
Y2  - 1 Sep 2025 - 2 Sep 2025
M2  - AA Eindhoven, Netherlands
LB  - PUB:(DE-HGF)31
UR  - https://juser.fz-juelich.de/record/1050751
ER  -

JuSER :: :: :: ::
Powered by v1.1.7 |
Maintained by

Impressum | Data Privacy Policy

This site is also available in the following languages:
Deutsch English