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Conference Presentation (Other) FZJ-2026-04401
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Effect of Residual Ion Drift during Programming of CMOS-Integrated Nanoscale HfO2-based Memristive Devices

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2026

CIMTEC 2026, PerugiaPerugia, Italy, 21 Jun 2026 - 25 Jun 20262026-06-212026-06-25

Contributing Institute(s):
  1. Elektronische Materialien (PGI-7)
  2. JARA-FIT (JARA-FIT)
  3. JARA Institut Green IT (PGI-10)
Research Program(s):
  1. 5233 - Memristive Materials and Devices (POF4-523) (POF4-523)
  2. BMBF 16ME0398K - Verbundprojekt: Neuro-inspirierte Technologien der künstlichen Intelligenz für die Elektronik der Zukunft - NEUROTEC II - (BMBF-16ME0398K) (BMBF-16ME0398K)
  3. BMFTR 03ZU2106AB - NeuroSys: KI-anwendungsspezifische Technologiereifung memristiver Bauteile (Projekt A) - Teilvorhaben B (03ZU2106AB) (03ZU2106AB)

Appears in the scientific report 2026
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The record appears in these collections:
Document types > Presentations > Conference Presentations
JARA > JARA > JARA-JARA\-FIT
Institute Collections > PGI > PGI-10
Institute Collections > PGI > PGI-7
Workflow collections > Public records
Publications database
 Record created 2026-09-11, last modified 2026-09-11
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