%0 Conference Paper
%A Kärkkänen, I.
%A Heikkilä, M.
%A Niinistö, J.
%A Ritala, M.
%A Leskelä, M.
%A Hoffmann-Eifert, S.
%A Waser, R.
%T Effect of processing and stacking sequence of ALD ZrO2 and TiO2 thin films on the structural and electrical properties
%M PreJuSER-111891
%D 2012
%Z Record converted from VDB: 16.11.2012
%< Thin Solid Films, The 6th Int. Conf. on Technological Advances of Thin Film & Surface Coatings
Y2 14 Jul 2012
M2 Singapore, 
%F PUB:(DE-HGF)6
%9 Conference Presentation
%U https://juser.fz-juelich.de/record/111891