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Effect of processing and stacking sequence of ALD ZrO2 and TiO2 thin films on the structural and electrical properties
Kärkkänen, I.FZJ* ; Heikkilä, M. ; Niinistö, J. ; Ritala, M. ; Leskelä, M. ; Hoffmann-Eifert, S.FZJ* ; Waser, R.FZJ*
2012
2012Thin Solid Films, The 6th Int. Conf. on Technological Advances of Thin Film & Surface Coatings
Seminar, SingaporeSingapore, 14 Jul 20122012-07-14
Note: Record converted from VDB: 16.11.2012
Contributing Institute(s):
- Elektronische Materialien (PGI-7)
- Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
Research Program(s):
- Grundlagen für zukünftige Informationstechnologien (P42)
Appears in the scientific report
2012