TY  - CONF
AU  - Kärkkänen, I.
AU  - Heikkilä, M.
AU  - Niinistö, J.
AU  - Ritala, M.
AU  - Leskelä, M.
AU  - Hoffmann-Eifert, S.
AU  - Waser, R.
TI  - Effect of processing and stacking sequence of ALD ZrO2 and TiO2 thin films on the structural and electrical properties
M1  - PreJuSER-111891
PY  - 2012
N1  - Record converted from VDB: 16.11.2012
Y2  - 14 Jul 2012
M2  - Singapore, 
LB  - PUB:(DE-HGF)6
UR  - https://juser.fz-juelich.de/record/111891
ER  -