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| Home > Publications database > Effect of processing and stacking sequence of ALD ZrO2 and TiO2 thin films on the structural and electrical properties > print |
| 001 | 111891 | ||
| 005 | 20180211182108.0 | ||
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| 100 | 1 | _ | |a Kärkkänen, I. |b 0 |u FZJ |0 P:(DE-Juel1)VDB109752 |
| 111 | 2 | _ | |c Singapore |d 2012-07-14 |
| 245 | _ | _ | |a Effect of processing and stacking sequence of ALD ZrO2 and TiO2 thin films on the structural and electrical properties |
| 260 | _ | _ | |c 2012 |
| 295 | 1 | 0 | |a Thin Solid Films, The 6th Int. Conf. on Technological Advances of Thin Film & Surface Coatings |
| 336 | 7 | _ | |a Conference Presentation |x Invited |2 PUB:(DE-HGF) |0 PUB:(DE-HGF)6 |
| 336 | 7 | _ | |a Conference Paper |0 33 |2 EndNote |
| 336 | 7 | _ | |a Other |2 DataCite |
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| 336 | 7 | _ | |a INPROCEEDINGS |2 BibTeX |
| 500 | _ | _ | |a Record converted from VDB: 16.11.2012 |
| 500 | _ | _ | |3 Presentation on a conference |
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| 700 | 1 | _ | |a Heikkilä, M. |b 1 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Niinistö, J. |b 2 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Ritala, M. |b 3 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Leskelä, M. |b 4 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Hoffmann-Eifert, S. |b 5 |u FZJ |0 P:(DE-Juel1)VDB3102 |
| 700 | 1 | _ | |a Waser, R. |b 6 |u FZJ |0 P:(DE-Juel1)131022 |
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| 914 | 1 | _ | |y 2012 |
| 920 | 1 | _ | |0 I:(DE-82)080009_20140620 |k JARA-FIT |l Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology |g JARA |x 1 |
| 920 | 1 | _ | |0 I:(DE-Juel1)PGI-7-20110106 |k PGI-7 |l Elektronische Materialien |g PGI |x 0 |
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