TY  - CONF
AU  - Hoffmann-Eifert, S.
TI  - Atomic layer deposition of oxide thin films for non-volatile memory applications
M1  - PreJuSER-111896
PY  - 2012
N1  - Record converted from VDB: 16.11.2012
Y2  - 25 Mar 2012
M2  - Berlin, 
LB  - PUB:(DE-HGF)6
UR  - https://juser.fz-juelich.de/record/111896
ER  -