TY  - CONF
AU  - Reiner, M.
AU  - Aslam, N.
AU  - Hoffmann-Eifert, S.
AU  - Waser, R.
TI  - Atomic layer deposition of TiO2 by TDMAT and H2O for resistive switching applications
M1  - PreJuSER-111900
PY  - 2012
N1  - Record converted from VDB: 16.11.2012
Y2  - 24 Jan 2012
M2  - Dresden, 
LB  - PUB:(DE-HGF)6
UR  - https://juser.fz-juelich.de/record/111900
ER  -