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Atomic layer deposition of TiO2 by TDMAT and H2O for resistive switching applications

 ;  ;  ;

2012

Novel High-k Application Workshop
Seminar, DresdenDresden, 24 Jan 20122012-01-24


Note: Record converted from VDB: 16.11.2012
Contributing Institute(s):
  1. Elektronische Materialien (PGI-7)
  2. Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
Research Program(s):
  1. Grundlagen für zukünftige Informationstechnologien (P42)

Appears in the scientific report 2012
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The record appears in these collections:
Document types > Presentations > Conference Presentations
JARA > JARA > JARA-JARA\-FIT
Institute Collections > PGI > PGI-7
Workflow collections > Public records
Publications database
 Record created 2012-11-16, last modified 2018-02-11
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