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Planar and Nanowire Schottky Barrier MOSFETs on SOI with NiSi and Epitaxial NiSi2 Contacts
Zhao, Q. T.FZJ* ; Knoll, L.FZJ* ; Schäfer, A.FZJ* ; Trellenkamp, S.FZJ* ; Bourdelle, K. K. ; Mantl, S.FZJ*
2012
201212th International Workshop on Junction Technology (IWJT-2012)
Seminar, Shanghai, ChinaShanghai, China, 14 May 20122012-05-14
Note: Record converted from VDB: 16.11.2012
Contributing Institute(s):
- Halbleiter-Nanoelektronik (PGI-9)
- Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
- Bioelektronik (PGI-8)
Research Program(s):
- Grundlagen für zukünftige Informationstechnologien (P42)
Appears in the scientific report
2012