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Contact resistivity and nickel silicidation of strained and unstrained silicon nanowires

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2010

Proceedings of 6th Workshop of the thematic Network on Silicon-on-Insulator Technology, devices and circuits, Grenoble, France, 25-27 January, 2010 (EUROSOI), 2010. - S. 45 - 46


Note: Record converted from VDB: 12.11.2012
Contributing Institute(s):
  1. Halbleiter-Nanoelektronik (IBN-1)
  2. Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
Research Program(s):
  1. Grundlagen für zukünftige Informationstechnologien (P42)

Appears in the scientific report 2010
Notes: Proceedings
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The record appears in these collections:
Document types > Presentations > Conference Presentations
JARA > JARA > JARA-JARA\-FIT
Institute Collections > PGI > PGI-9
Document types > Books > Books
Workflow collections > Public records
Publications database
 Record created 2012-11-13, last modified 2018-02-08
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