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@INPROCEEDINGS{Habicht:11473,
      author       = {Habicht, S. and Knoll, L. and Zhao, Q. T. and Feste, S. and
                      Mantl, S.},
      title        = {{C}ontact resistivity and nickel silicidation of strained
                      and unstrained silicon nanowires},
      reportid     = {PreJuSER-11473},
      year         = {2010},
      note         = {Record converted from VDB: 12.11.2012},
      comment      = {Proceedings of 6th Workshop of the thematic Network on
                      Silicon-on-Insulator Technology, devices and circuits,
                      Grenoble, France, 25-27 January, 2010 (EUROSOI), 2010. - S.
                      45 - 46},
      booktitle     = {Proceedings of 6th Workshop of the
                       thematic Network on
                       Silicon-on-Insulator Technology,
                       devices and circuits, Grenoble, France,
                       25-27 January, 2010 (EUROSOI), 2010. -
                       S. 45 - 46},
      cin          = {IBN-1 / JARA-FIT},
      cid          = {I:(DE-Juel1)VDB799 / $I:(DE-82)080009_20140620$},
      pnm          = {Grundlagen für zukünftige Informationstechnologien},
      pid          = {G:(DE-Juel1)FUEK412},
      typ          = {PUB:(DE-HGF)8 / PUB:(DE-HGF)7},
      url          = {https://juser.fz-juelich.de/record/11473},
}