Gast ::
| Hauptseite > Publikationsdatenbank > Strained-SiGe p-MOSFET with LaLuO3 as high-k gate dielectric and TiN as metal gate > print |
| Hauptseite > Publikationsdatenbank > Strained-SiGe p-MOSFET with LaLuO3 as high-k gate dielectric and TiN as metal gate > print |
| 001 | 11478 | ||
| 005 | 20180208233754.0 | ||
| 037 | _ | _ | |a PreJuSER-11478 |
| 100 | 1 | _ | |a Yu, W. |b 0 |u FZJ |0 P:(DE-Juel1)VDB69007 |
| 111 | 2 | _ | |c Grenoble, France |d 2010-01-25 |
| 245 | _ | _ | |a Strained-SiGe p-MOSFET with LaLuO3 as high-k gate dielectric and TiN as metal gate |
| 260 | _ | _ | |c 2010 |
| 295 | 1 | 0 | |a 6th Workshop of the thematic Network on Silicon-on-Insulator Technology (EUROSOI) |
| 336 | 7 | _ | |a Conference Presentation |0 PUB:(DE-HGF)6 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a Conference Paper |0 33 |2 EndNote |
| 336 | 7 | _ | |a Other |2 DataCite |
| 336 | 7 | _ | |a LECTURE_SPEECH |2 ORCID |
| 336 | 7 | _ | |a conferenceObject |2 DRIVER |
| 336 | 7 | _ | |a INPROCEEDINGS |2 BibTeX |
| 500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
| 500 | _ | _ | |3 Presentation on a conference |
| 536 | _ | _ | |a Grundlagen für zukünftige Informationstechnologien |c P42 |2 G:(DE-HGF) |0 G:(DE-Juel1)FUEK412 |x 0 |
| 700 | 1 | _ | |a Zhang, B. |b 1 |u FZJ |0 P:(DE-Juel1)VDB83419 |
| 700 | 1 | _ | |a Zhao, Q. T. |b 2 |u FZJ |0 P:(DE-Juel1)VDB5539 |
| 700 | 1 | _ | |a Hartmann, J.M. |b 3 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Buca, D. |b 4 |u FZJ |0 P:(DE-Juel1)125569 |
| 700 | 1 | _ | |a Nichau, A. |b 5 |u FZJ |0 P:(DE-Juel1)VDB88502 |
| 700 | 1 | _ | |a Durgun Özben, E. |b 6 |u FZJ |0 P:(DE-Juel1)156578 |
| 700 | 1 | _ | |a Lopes, J. M. J. |b 7 |u FZJ |0 P:(DE-Juel1)VDB64746 |
| 700 | 1 | _ | |a Schubert, J. |b 8 |u FZJ |0 P:(DE-Juel1)128631 |
| 700 | 1 | _ | |a Ghyselen, B. |b 9 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Mantl, S. |b 10 |u FZJ |0 P:(DE-Juel1)VDB4959 |
| 909 | C | O | |o oai:juser.fz-juelich.de:11478 |p VDB |
| 913 | 1 | _ | |k P42 |v Grundlagen für zukünftige Informationstechnologien |l Grundlagen für zukünftige Informationstechnologien (FIT) |b Schlüsseltechnologien |0 G:(DE-Juel1)FUEK412 |x 0 |
| 914 | 1 | _ | |y 2010 |
| 920 | 1 | _ | |d 31.12.2010 |g IBN |k IBN-1 |l Halbleiter-Nanoelektronik |0 I:(DE-Juel1)VDB799 |x 0 |
| 920 | 1 | _ | |0 I:(DE-82)080009_20140620 |k JARA-FIT |l Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology |g JARA |x 1 |
| 970 | _ | _ | |a VDB:(DE-Juel1)122621 |
| 980 | _ | _ | |a VDB |
| 980 | _ | _ | |a ConvertedRecord |
| 980 | _ | _ | |a conf |
| 980 | _ | _ | |a I:(DE-Juel1)PGI-9-20110106 |
| 980 | _ | _ | |a I:(DE-82)080009_20140620 |
| 980 | _ | _ | |a UNRESTRICTED |
| 981 | _ | _ | |a I:(DE-Juel1)PGI-9-20110106 |
| 981 | _ | _ | |a I:(DE-Juel1)VDB881 |
| Library | Collection | CLSMajor | CLSMinor | Language | Author |
|---|