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| Hauptseite > Publikationsdatenbank > High mobility strained SOI MOSFETs with LaScO3/TiN gate stacks fabricated with a replacement gate process > print |
| Hauptseite > Publikationsdatenbank > High mobility strained SOI MOSFETs with LaScO3/TiN gate stacks fabricated with a replacement gate process > print |
| 001 | 11561 | ||
| 005 | 20180208232804.0 | ||
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| 100 | 1 | _ | |a Durgun Özben, E. |b 0 |u FZJ |0 P:(DE-Juel1)156578 |
| 111 | 2 | _ | |c Glasgow, Scotland |d 2010-03-18 |
| 245 | _ | _ | |a High mobility strained SOI MOSFETs with LaScO3/TiN gate stacks fabricated with a replacement gate process |
| 260 | _ | _ | |c 2010 |
| 295 | 1 | 0 | |a 11thb International Conference on Ultimate Integratuin on Silicon (ULIS) |
| 336 | 7 | _ | |a Conference Presentation |0 PUB:(DE-HGF)6 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a Conference Paper |0 33 |2 EndNote |
| 336 | 7 | _ | |a Other |2 DataCite |
| 336 | 7 | _ | |a LECTURE_SPEECH |2 ORCID |
| 336 | 7 | _ | |a conferenceObject |2 DRIVER |
| 336 | 7 | _ | |a INPROCEEDINGS |2 BibTeX |
| 500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
| 500 | _ | _ | |3 Presentation on a conference |
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| 700 | 1 | _ | |a Lopes, J. M. J. |b 1 |u FZJ |0 P:(DE-Juel1)VDB64746 |
| 700 | 1 | _ | |a Roeckerath, M. |b 2 |u FZJ |0 P:(DE-Juel1)VDB64142 |
| 700 | 1 | _ | |a Nichau, A. |b 3 |u FZJ |0 P:(DE-Juel1)VDB88502 |
| 700 | 1 | _ | |a Luptak, R. |b 4 |u FZJ |0 P:(DE-Juel1)VDB76324 |
| 700 | 1 | _ | |a Lenk, S. |b 5 |u FZJ |0 P:(DE-Juel1)128602 |
| 700 | 1 | _ | |a Besmehn, A. |b 6 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Ghyselen, B. |b 7 |u FZJ |0 P:(DE-Juel1)VDB77893 |
| 700 | 1 | _ | |a Zhao, Q. T. |b 8 |u FZJ |0 P:(DE-Juel1)VDB5539 |
| 700 | 1 | _ | |a Schubert, J. |b 9 |u FZJ |0 P:(DE-Juel1)128631 |
| 700 | 1 | _ | |a Mantl, S. |b 10 |u FZJ |0 P:(DE-Juel1)VDB4959 |
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| 914 | 1 | _ | |y 2010 |
| 920 | 1 | _ | |d 31.12.2010 |g IBN |k IBN-1 |l Halbleiter-Nanoelektronik |0 I:(DE-Juel1)VDB799 |x 0 |
| 920 | 1 | _ | |0 I:(DE-82)080009_20140620 |k JARA-FIT |l Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology |g JARA |x 1 |
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