%0 Journal Article
%A Skorb, E.V.
%A Grützmacher, D.
%A Dais, C.
%A Guzenko, V.A.
%A Sokolov, V.G.
%A Gaevskaya, T.V.
%A Sviridov, D.V.
%T Titania-assisted electron-beam and synchrotron lithography
%J Nanotechnology
%V 21
%@ 0957-4484
%C Bristol
%I IOP Publ.
%M PreJuSER-12075
%P 315301
%D 2010
%Z This work was supported by the Humboldt Foundation and the NATO Collaboration Linkage grant. EV thanks Dr Dmitry Shchukin for helpful discussion.
%X Novel imaging layer technology for electron-beam and extreme-ultraviolet lithographic processes based upon generation of Pd nanoparticles in the Pd(2+)-loaded TiO(2) films was developed. The electroless metallization of the patterned TiO(2):Pd(2+) films yields both negative and positive nickel images with resolution down to approximately 100 nm.
%K J (WoSType)
%F PUB:(DE-HGF)16
%9 Journal Article
%$ pmid:20634573
%U <Go to ISI:>//WOS:000279961200010
%R 10.1088/0957-4484/21/31/315301
%U https://juser.fz-juelich.de/record/12075