Journal Article

PreJuSER-12075

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Titania-assisted electron-beam and synchrotron lithography

Skorb, E. V. ; Grützmacher, D.FZJ* ; Dais, C. ; Guzenko, V. A. ; Sokolov, V. G. ; Gaevskaya, T. V. ; Sviridov, D. V.

2010
IOP Publ. Bristol

This record in other databases:    

Please use a persistent id in citations: doi:10.1088/0957-4484/21/31/315301

Abstract: Novel imaging layer technology for electron-beam and extreme-ultraviolet lithographic processes based upon generation of Pd nanoparticles in the Pd(2+)-loaded TiO(2) films was developed. The electroless metallization of the patterned TiO(2):Pd(2+) films yields both negative and positive nickel images with resolution down to approximately 100 nm.

Keyword(s): J

Note: This work was supported by the Humboldt Foundation and the NATO Collaboration Linkage grant. EV thanks Dr Dmitry Shchukin for helpful discussion.

---

Contributing Institute(s):

1. Halbleiter-Nanoelektronik (IBN-1)
2. Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)

Research Program(s):

1. Grundlagen für zukünftige Informationstechnologien (P42)

Appears in the scientific report 2010

---