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@ARTICLE{Skorb:12075,
author = {Skorb, E.V. and Grützmacher, D. and Dais, C. and Guzenko,
V.A. and Sokolov, V.G. and Gaevskaya, T.V. and Sviridov,
D.V.},
title = {{T}itania-assisted electron-beam and synchrotron
lithography},
journal = {Nanotechnology},
volume = {21},
issn = {0957-4484},
address = {Bristol},
publisher = {IOP Publ.},
reportid = {PreJuSER-12075},
pages = {315301},
year = {2010},
note = {This work was supported by the Humboldt Foundation and the
NATO Collaboration Linkage grant. EV thanks Dr Dmitry
Shchukin for helpful discussion.},
abstract = {Novel imaging layer technology for electron-beam and
extreme-ultraviolet lithographic processes based upon
generation of Pd nanoparticles in the Pd(2+)-loaded TiO(2)
films was developed. The electroless metallization of the
patterned TiO(2):Pd(2+) films yields both negative and
positive nickel images with resolution down to approximately
100 nm.},
keywords = {J (WoSType)},
cin = {IBN-1 / JARA-FIT},
ddc = {530},
cid = {I:(DE-Juel1)VDB799 / $I:(DE-82)080009_20140620$},
pnm = {Grundlagen für zukünftige Informationstechnologien},
pid = {G:(DE-Juel1)FUEK412},
shelfmark = {Nanoscience $\&$ Nanotechnology / Materials Science,
Multidisciplinary / Physics, Applied},
typ = {PUB:(DE-HGF)16},
pubmed = {pmid:20634573},
UT = {WOS:000279961200010},
doi = {10.1088/0957-4484/21/31/315301},
url = {https://juser.fz-juelich.de/record/12075},
}