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| Hauptseite > Publikationsdatenbank > Titania-assisted electron-beam and synchrotron lithography > print |
| Hauptseite > Publikationsdatenbank > Titania-assisted electron-beam and synchrotron lithography > print |
| 001 | 12075 | ||
| 005 | 20180208212934.0 | ||
| 024 | 7 | _ | |2 pmid |a pmid:20634573 |
| 024 | 7 | _ | |2 DOI |a 10.1088/0957-4484/21/31/315301 |
| 024 | 7 | _ | |2 WOS |a WOS:000279961200010 |
| 037 | _ | _ | |a PreJuSER-12075 |
| 041 | _ | _ | |a eng |
| 082 | _ | _ | |a 530 |
| 084 | _ | _ | |2 WoS |a Nanoscience & Nanotechnology |
| 084 | _ | _ | |2 WoS |a Materials Science, Multidisciplinary |
| 084 | _ | _ | |2 WoS |a Physics, Applied |
| 100 | 1 | _ | |a Skorb, E.V. |b 0 |0 P:(DE-HGF)0 |
| 245 | _ | _ | |a Titania-assisted electron-beam and synchrotron lithography |
| 260 | _ | _ | |a Bristol |b IOP Publ. |c 2010 |
| 300 | _ | _ | |a 315301 |
| 336 | 7 | _ | |a Journal Article |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
| 336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
| 336 | 7 | _ | |a ARTICLE |2 BibTeX |
| 336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
| 336 | 7 | _ | |a article |2 DRIVER |
| 440 | _ | 0 | |a Nanotechnology |x 0957-4484 |0 4475 |y 31 |v 21 |
| 500 | _ | _ | |a This work was supported by the Humboldt Foundation and the NATO Collaboration Linkage grant. EV thanks Dr Dmitry Shchukin for helpful discussion. |
| 520 | _ | _ | |a Novel imaging layer technology for electron-beam and extreme-ultraviolet lithographic processes based upon generation of Pd nanoparticles in the Pd(2+)-loaded TiO(2) films was developed. The electroless metallization of the patterned TiO(2):Pd(2+) films yields both negative and positive nickel images with resolution down to approximately 100 nm. |
| 536 | _ | _ | |a Grundlagen für zukünftige Informationstechnologien |c P42 |2 G:(DE-HGF) |0 G:(DE-Juel1)FUEK412 |x 0 |
| 588 | _ | _ | |a Dataset connected to Web of Science, Pubmed |
| 650 | _ | 7 | |a J |2 WoSType |
| 700 | 1 | _ | |a Grützmacher, D. |b 1 |u FZJ |0 P:(DE-Juel1)125588 |
| 700 | 1 | _ | |a Dais, C. |b 2 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Guzenko, V.A. |b 3 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Sokolov, V.G. |b 4 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Gaevskaya, T.V. |b 5 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Sviridov, D.V. |b 6 |0 P:(DE-HGF)0 |
| 773 | _ | _ | |a 10.1088/0957-4484/21/31/315301 |g Vol. 21, p. 315301 |p 315301 |q 21<315301 |0 PERI:(DE-600)1362365-5 |t Nanotechnology |v 21 |y 2010 |x 0957-4484 |
| 856 | 7 | _ | |u http://dx.doi.org/10.1088/0957-4484/21/31/315301 |
| 909 | C | O | |o oai:juser.fz-juelich.de:12075 |p VDB |
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| 914 | 1 | _ | |y 2010 |
| 915 | _ | _ | |0 StatID:(DE-HGF)0010 |a JCR/ISI refereed |
| 920 | 1 | _ | |d 31.12.2010 |g IBN |k IBN-1 |l Halbleiter-Nanoelektronik |0 I:(DE-Juel1)VDB799 |x 0 |
| 920 | 1 | _ | |0 I:(DE-82)080009_20140620 |k JARA-FIT |l Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology |g JARA |x 1 |
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| 980 | _ | _ | |a UNRESTRICTED |
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