%0 Conference Paper
%A Zhao, Q. T.
%A Yu, W.
%A Zhang, B.
%A Lopes, J. M. J.
%A Buca, D.
%A Minamisawa, R. A.
%A Durgun Özben, E.
%A Luptak, R.
%A Feste, S. F.
%A Nichau, A.
%A Schubert, J.
%A Holländer, B.
%A Hartmann, J.M.
%A Bourdelle, K.K.
%A Kernevez, N.
%A Mantl, S.
%T High mobility Si-Ge channel and high-k materials for NanoMOSFETs
%M PreJuSER-12090
%D 2010
%Z Record converted from VDB: 12.11.2012
%< 5th International SiGe Technology and Device Meeting (ISTDM 2010)
Y2 24 May 2010
M2 Stockholm, Schweden, 
%F PUB:(DE-HGF)6
%9 Conference Presentation
%U https://juser.fz-juelich.de/record/12090