%0 Conference Paper
%A Minamisawa, R. A.
%A Habicht, S.
%A Knoll, L.
%A Feste, S. F.
%A Zhao, Q. T.
%A Kernevez, N.
%A Bourdelle, K.K.
%T From strained SOI layers to sSi NW: stress and electrical characterization
%M PreJuSER-12107
%D 2010
%Z Record converted from VDB: 12.11.2012
%< 5th International SiGe Technology and Device Meeting (ISTDm2010)
Y2 24 May 2010
M2 Stockholm, Schweden, 
%F PUB:(DE-HGF)31
%9 Talk (non conference)
%U https://juser.fz-juelich.de/record/12107