Home > Publications database > From strained SOI layers to sSi NW: stress and electrical characterization > RIS |
TY - CONF AU - Minamisawa, R. A. AU - Habicht, S. AU - Knoll, L. AU - Feste, S. F. AU - Zhao, Q. T. AU - Kernevez, N. AU - Bourdelle, K.K. TI - From strained SOI layers to sSi NW: stress and electrical characterization M1 - PreJuSER-12107 PY - 2010 N1 - Record converted from VDB: 12.11.2012 Y2 - 24 May 2010 M2 - Stockholm, Schweden, LB - PUB:(DE-HGF)31 UR - https://juser.fz-juelich.de/record/12107 ER -