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@INPROCEEDINGS{Minamisawa:12107,
      author       = {Minamisawa, R. A. and Habicht, S. and Knoll, L. and Feste,
                      S. F. and Zhao, Q. T. and Kernevez, N. and Bourdelle, K.K.},
      title        = {{F}rom strained {SOI} layers to s{S}i {NW}: stress and
                      electrical characterization},
      reportid     = {PreJuSER-12107},
      year         = {2010},
      note         = {Record converted from VDB: 12.11.2012},
      comment      = {5th International SiGe Technology and Device Meeting
                      (ISTDm2010)},
      booktitle     = {5th International SiGe Technology and
                       Device Meeting (ISTDm2010)},
      month         = {May},
      date          = {2010-05-24},
      organization  = {Stockholm, Schweden, 24 May 2010},
      cin          = {IBN-1 / JARA-FIT},
      cid          = {I:(DE-Juel1)VDB799 / $I:(DE-82)080009_20140620$},
      pnm          = {Grundlagen für zukünftige Informationstechnologien},
      pid          = {G:(DE-Juel1)FUEK412},
      typ          = {PUB:(DE-HGF)31},
      url          = {https://juser.fz-juelich.de/record/12107},
}