Journal Article

FZJ-2012-00154

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Optimized marker definition for high overlay accuracy e-beam lithography

Moers, J. (Corresponding author) ; Trellenkamp, S. ; Grützmacher, D.FZJ* ; Offenhäusser, A.FZJ* ; Rienks, B.

2012
Elsevier [S.l.] @

This record in other databases:  

Please use a persistent id in citations: doi:10.1016/j.mee.2012.04.029

---

Contributing Institute(s):

1. Bioelektronik (PGI-8)
2. Halbleiter-Nanoelektronik (PGI-9)
3. PGI-8-PT (PGI-8-PT)

Research Program(s):

1. 42G - Peter Grünberg-Centre (PG-C) (POF2-42G41) (POF2-42G41)

Appears in the scientific report 2012

---

Database coverage:
; BIOSIS Previews ; JCR ; Nationallizenz ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection

---