%0 Journal Article
%A Moers, J.
%A Trellenkamp, St.
%A Grützmacher, D.
%A Offenhäusser, A.
%A Rienks, B.
%T Optimized marker definition for high overlay accuracy e-beam lithography
%J Microelectronic engineering
%V 97
%C [S.l.] @
%I Elsevier
%M FZJ-2012-00154
%P 68 - 71
%D 2012
%F PUB:(DE-HGF)16
%9 Journal Article
%U <Go to ISI:>//WOS:000309316300016
%R 10.1016/j.mee.2012.04.029
%U https://juser.fz-juelich.de/record/127087