TY  - JOUR
AU  - Moers, J.
AU  - Trellenkamp, St.
AU  - Grützmacher, D.
AU  - Offenhäusser, A.
AU  - Rienks, B.
TI  - Optimized marker definition for high overlay accuracy e-beam lithography
JO  - Microelectronic engineering
VL  - 97
CY  - [S.l.] @
PB  - Elsevier
M1  - FZJ-2012-00154
SP  - 68 - 71
PY  - 2012
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000309316300016
DO  - DOI:10.1016/j.mee.2012.04.029
UR  - https://juser.fz-juelich.de/record/127087
ER  -