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@ARTICLE{Moers:127087,
      author       = {Moers, J. and Trellenkamp, St. and Grützmacher, D. and
                      Offenhäusser, A. and Rienks, B.},
      title        = {{O}ptimized marker definition for high overlay accuracy
                      e-beam lithography},
      journal      = {Microelectronic engineering},
      volume       = {97},
      address      = {[S.l.] @},
      publisher    = {Elsevier},
      reportid     = {FZJ-2012-00154},
      pages        = {68 - 71},
      year         = {2012},
      cin          = {PGI-8 / PGI-9 / PGI-8-PT},
      ddc          = {620},
      cid          = {I:(DE-Juel1)PGI-8-20110106 / I:(DE-Juel1)PGI-9-20110106 /
                      I:(DE-Juel1)PGI-8-PT-20110228},
      pnm          = {42G - Peter Grünberg-Centre (PG-C) (POF2-42G41)},
      pid          = {G:(DE-HGF)POF2-42G41},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000309316300016},
      doi          = {10.1016/j.mee.2012.04.029},
      url          = {https://juser.fz-juelich.de/record/127087},
}