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| Hauptseite > Publikationsdatenbank > Low temperature RPCVD epitaxial growth of Si 1-xGe x and Ge using Si2H6 and Ge2H6 > print |
| Hauptseite > Publikationsdatenbank > Low temperature RPCVD epitaxial growth of Si 1-xGe x and Ge using Si2H6 and Ge2H6 > print |
| 001 | 127118 | ||
| 005 | 20210129210912.0 | ||
| 037 | _ | _ | |a FZJ-2012-00184 |
| 100 | 1 | _ | |a Wirths, Stephan |0 P:(DE-Juel1)138778 |b 0 |e Corresponding author |
| 111 | 2 | _ | |a International Silicon-Germanium Technology and Device Meeting |w USA |c UC Berkeley |d 2012-06-04 - 2012-12-06 |g ISTDM 2012 |
| 245 | _ | _ | |a Low temperature RPCVD epitaxial growth of Si 1-xGe x and Ge using Si2H6 and Ge2H6 |
| 260 | _ | _ | |c 2012 |
| 336 | 7 | _ | |a Proceedings |b proc |m proc |0 PUB:(DE-HGF)26 |s 1361168879_15168 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a PROCEEDINGS |2 BibTeX |
| 336 | 7 | _ | |a BOOK |2 ORCID |
| 336 | 7 | _ | |a Output Types/Book |2 DataCite |
| 336 | 7 | _ | |a conferenceObject |2 DRIVER |
| 336 | 7 | _ | |a Conference Proceedings |0 3 |2 EndNote |
| 536 | _ | _ | |a 421 - Frontiers of charge based Electronics (POF2-421) |0 G:(DE-HGF)POF2-421 |c POF2-421 |x 0 |f POF II |
| 700 | 1 | _ | |a Buca, Dan Mihai |0 P:(DE-Juel1)125569 |b 1 |
| 700 | 1 | _ | |a Tiedemann, Andreas |0 P:(DE-Juel1)128639 |b 2 |
| 700 | 1 | _ | |a Bernardy, Patric |0 P:(DE-Juel1)138772 |b 3 |
| 700 | 1 | _ | |a Holländer, Bernhard |0 P:(DE-Juel1)125595 |b 4 |
| 700 | 1 | _ | |a Stoica, Toma |0 P:(DE-Juel1)128637 |b 5 |
| 700 | 1 | _ | |a Mussler, Gregor |0 P:(DE-Juel1)128617 |b 6 |
| 700 | 1 | _ | |a Breuer, U |0 P:(DE-HGF)0 |b 7 |
| 700 | 1 | _ | |a Mantl, Siegfried |0 P:(DE-Juel1)128609 |b 8 |
| 909 | _ | _ | |p VDB |o oai:juser.fz-juelich.de:127118 |
| 909 | _ | _ | |p VDB |o oai:juser.fz-juelich.de:127118 |
| 909 | C | O | |o oai:juser.fz-juelich.de:127118 |p VDB |
| 910 | 1 | _ | |a Forschungszentrum Jülich GmbH |0 I:(DE-588b)5008462-8 |k FZJ |b 0 |6 P:(DE-Juel1)138778 |
| 910 | 1 | _ | |a Forschungszentrum Jülich GmbH |0 I:(DE-588b)5008462-8 |k FZJ |b 1 |6 P:(DE-Juel1)125569 |
| 910 | 1 | _ | |a Forschungszentrum Jülich GmbH |0 I:(DE-588b)5008462-8 |k FZJ |b 2 |6 P:(DE-Juel1)128639 |
| 910 | 1 | _ | |a Forschungszentrum Jülich GmbH |0 I:(DE-588b)5008462-8 |k FZJ |b 3 |6 P:(DE-Juel1)138772 |
| 910 | 1 | _ | |a Forschungszentrum Jülich GmbH |0 I:(DE-588b)5008462-8 |k FZJ |b 4 |6 P:(DE-Juel1)125595 |
| 910 | 1 | _ | |a Forschungszentrum Jülich GmbH |0 I:(DE-588b)5008462-8 |k FZJ |b 5 |6 P:(DE-Juel1)128637 |
| 910 | 1 | _ | |a Forschungszentrum Jülich GmbH |0 I:(DE-588b)5008462-8 |k FZJ |b 6 |6 P:(DE-Juel1)128617 |
| 910 | 1 | _ | |a Forschungszentrum Jülich GmbH |0 I:(DE-588b)5008462-8 |k FZJ |b 8 |6 P:(DE-Juel1)128609 |
| 913 | 1 | _ | |a DE-HGF |b Schlüsseltechnologien |1 G:(DE-HGF)POF2-420 |0 G:(DE-HGF)POF2-421 |2 G:(DE-HGF)POF2-400 |v Frontiers of charge based Electronics |x 0 |4 G:(DE-HGF)POF |3 G:(DE-HGF)POF2 |l Grundlagen zukünftiger Informationstechnologien |
| 914 | 1 | _ | |y 2012 |
| 920 | 1 | _ | |0 I:(DE-Juel1)PGI-9-20110106 |k PGI-9 |l Halbleiter-Nanoelektronik |x 0 |
| 920 | 1 | _ | |0 I:(DE-82)080009_20140620 |k JARA-FIT |l Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology |x 1 |
| 980 | _ | _ | |a proc |
| 980 | _ | _ | |a VDB |
| 980 | _ | _ | |a UNRESTRICTED |
| 980 | _ | _ | |a I:(DE-Juel1)PGI-9-20110106 |
| 980 | _ | _ | |a I:(DE-82)080009_20140620 |
| 981 | _ | _ | |a I:(DE-Juel1)VDB881 |
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