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@ARTICLE{Wirths:134318,
author = {Wirths, S. and Tiedemann, Andreas and Ikonic, Z. and
Harrison, P. and Holländer, Bernhard and Stoica, T. and
Mussler, G. and Myronov, M. and Hartmann, J. M. and
Grützmacher, D. and Buca, D. and Mantl, S.},
title = {{B}and engineering and growth of tensile strained
{G}e/({S}i){G}e{S}n heterostructures for tunnel field effect
transistors},
journal = {Applied physics letters},
volume = {102},
number = {19},
address = {Melville, NY},
publisher = {American Institute of Physics},
reportid = {FZJ-2013-02545},
pages = {192103 -},
year = {2013},
abstract = {In this letter, we propose a heterostructure design for
tunnel field effect transistors with two low direct bandgap
group IV compounds, GeSn and highly tensely strained Ge in
combination with ternary SiGeSn alloy. Electronic band
calculations show that strained Ge, used as channel, grown
on Ge1−xSnx $(x > 9\%)$ buffer, as source, becomes a
direct bandgap which significantly increases the tunneling
probability. The SiGeSn ternaries are well suitable as drain
since they offer a large indirect bandgap. The growth of
such heterostructures with the desired band alignment is
presented. The crystalline quality of the (Si)Ge(Sn) layers
is similar to state-of-the-art SiGe layers.},
cin = {PGI-9 / JARA-FIT},
ddc = {530},
cid = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$},
pnm = {421 - Frontiers of charge based Electronics (POF2-421)},
pid = {G:(DE-HGF)POF2-421},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000320440800043},
doi = {10.1063/1.4805034},
url = {https://juser.fz-juelich.de/record/134318},
}