TY  - JOUR
AU  - Korte, Stefan
AU  - Steidl, Matthias
AU  - Prost, Werner
AU  - Cherepanov, Vasily
AU  - Voigtländer, Bert
AU  - Zhao, Weihong
AU  - Kleinschmidt, Peter
AU  - Hannappel, Thomas
TI  - Resistance and dopant profiling along freestanding GaAs nanowires
JO  - Applied physics letters
VL  - 103
IS  - 14
SN  - 0003-6951
CY  - Melville, NY
PB  - American Institute of Physics
M1  - FZJ-2013-04587
SP  - 143104 -
PY  - 2013
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000325488500088
DO  - DOI:10.1063/1.4823547
UR  - https://juser.fz-juelich.de/record/138476
ER  -