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@ARTICLE{Rieger:138536,
      author       = {Rieger, Torsten and Grützmacher, Detlev and Lepsa, Mihail
                      Ion},
      title        = {{S}i substrate preparation for the {VS} and {VLS} growth of
                      {I}n{A}s nanowires},
      journal      = {Physica status solidi / Rapid research letters},
      volume       = {7},
      number       = {10},
      issn         = {1862-6254},
      address      = {Weinheim},
      publisher    = {Wiley-VCH},
      reportid     = {FZJ-2013-04641},
      pages        = {840 - 844},
      year         = {2013},
      abstract     = {The growth of self-catalyzed InAs nanowires on Si(111)
                      substrates via vapour–solid (VS) and
                      vapour–liquid–solid (VLS) growth mechanisms is
                      investigated using molecular beam epitaxy. For both
                      mechanisms, the substrate preparation plays a crucial role.
                      In this context, the required thin oxide layer for the VS
                      growth of the nanowires is obtained by treating the
                      HF-cleaned Si substrate with hydrogen peroxide. For the VLS
                      growth, Ga is predeposited on the unprocessed Si substrate.
                      The Ga forms droplets, which etch the native oxide and
                      create the necessary pinholes. (© 2013 WILEY-VCH Verlag
                      GmbH $\&$ Co. KGaA, Weinheim)},
      cin          = {PGI-9},
      ddc          = {530},
      cid          = {I:(DE-Juel1)PGI-9-20110106},
      pnm          = {421 - Frontiers of charge based Electronics (POF2-421)},
      pid          = {G:(DE-HGF)POF2-421},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000328484500014},
      doi          = {10.1002/pssr.201307229},
      url          = {https://juser.fz-juelich.de/record/138536},
}