001     139325
005     20210129212543.0
020 _ _ |a 978-3-89336-870-9
037 _ _ |a FZJ-2013-05322
041 _ _ |a English
082 _ _ |a 500
100 1 _ |a Winden, Andreas
|0 P:(DE-Juel1)144014
|b 0
|u fzj
|e Corresponding author
111 2 _ |a 15th European Workshop on Metal Organic Vapour Phase Epitaxy
|w Germany
|c Aachen
|d 2013-06-02 - 2013-06-05
|g EWMOVPE XV
245 _ _ |a MOVPE of site-controlled pyramidal (Ga,In)N hetero-nanostructures for future single photons emitters
260 _ _ |a Jülich
|c 2013
|b Forschungszentrum Jülich
336 7 _ |a Proceedings
|b proc
|m proc
|0 PUB:(DE-HGF)26
|s 1385384509_17399
|2 PUB:(DE-HGF)
336 7 _ |a PROCEEDINGS
|2 BibTeX
336 7 _ |a BOOK
|2 ORCID
336 7 _ |a Output Types/Book
|2 DataCite
336 7 _ |a conferenceObject
|2 DRIVER
336 7 _ |a Conference Proceedings
|0 3
|2 EndNote
490 0 _ |v 27
520 _ _ |a In this work, we report on how to obtain site- and size-controlled InN quantum dots (QDs) by selective area metalorganic vapour phase epitaxy (SA-MOVPE) and how to embed them into a vertical p-n junction for future single photon emitters. To this purpose we investigated the growth of InN nanostructures in differently sized mask apertures as a function of the growth time and established a low temperature growth process to cover these structures with a p-doped GaN cap layer. We observed that single sub-25 nm quantum dots can be achieved when the aperture diameter is reduced to 20 nm and the growth time accounts for less than a minute. Micro-photoluminescence (μ-PL) measurements on single GaN capped InN nano-pyramids exhibit a broad and intense DAP transition band in the range of 2.85 eV indicating successful p-doping.
536 _ _ |a 421 - Frontiers of charge based Electronics (POF2-421)
|0 G:(DE-HGF)POF2-421
|c POF2-421
|x 0
|f POF II
588 _ _ |a Dataset connected to GVK,
700 1 _ |a Mikulics, Martin
|0 P:(DE-Juel1)128613
|b 1
700 1 _ |a Grützmacher, Detlev
|0 P:(DE-Juel1)125588
|b 2
700 1 _ |a Hardtdegen, Hilde
|0 P:(DE-Juel1)125593
|b 3
909 C O |o oai:juser.fz-juelich.de:139325
|p VDB
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 0
|6 P:(DE-Juel1)144014
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 1
|6 P:(DE-Juel1)128613
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 2
|6 P:(DE-Juel1)125588
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 3
|6 P:(DE-Juel1)125593
913 1 _ |a DE-HGF
|b Schlüsseltechnologien
|1 G:(DE-HGF)POF2-420
|0 G:(DE-HGF)POF2-421
|2 G:(DE-HGF)POF2-400
|v Frontiers of charge based Electronics
|x 0
|4 G:(DE-HGF)POF
|3 G:(DE-HGF)POF2
|l Grundlagen zukünftiger Informationstechnologien
914 1 _ |y 2013
920 _ _ |l yes
920 1 _ |0 I:(DE-Juel1)PGI-9-20110106
|k PGI-9
|l Halbleiter-Nanoelektronik
|x 0
980 _ _ |a proc
980 _ _ |a VDB
980 _ _ |a UNRESTRICTED
980 _ _ |a I:(DE-Juel1)PGI-9-20110106


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